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Effects of background gas on sulfur hexafluoride removal by atmospheric dielectric barrier discharge plasma

Authors :
Xiaoxing Zhang
Hanyan Xiao
Xiongxiong Hu
Yingang Gui
Source :
AIP Advances, Vol 6, Iss 11, Pp 115005-115005-8 (2016)
Publication Year :
2016
Publisher :
AIP Publishing LLC, 2016.

Abstract

The effects of background gases (He, Ar, N2 and air) on SF6 removal in a dielectric barrier reactor were investigated at atmospheric pressure. A comparison among these background gases was performed in terms of discharge voltage, discharge power, mean electron energy, electron density, removal efficiency and energy yield for the destruction of SF6. Results showed that the discharge voltage of He and Ar was lower than that of N2 and air, but the difference of their discharge power was small. Compared with three other background gases, Ar had a relatively superior destruction and removal rate and energy yield since the mean electron energy and electron density in SF6/H2O/Ar plasma were both maintained at a high level. Complete removal of 2% SF6 could be achieved at a discharge power of 48.86 W with Ar and the corresponding energy yield can reach 4.8 g/kWh.

Subjects

Subjects :
Physics
QC1-999

Details

Language :
English
ISSN :
21583226
Volume :
6
Issue :
11
Database :
Directory of Open Access Journals
Journal :
AIP Advances
Publication Type :
Academic Journal
Accession number :
edsdoj.55b4f3827b8a4798a9cd91682c5fa162
Document Type :
article
Full Text :
https://doi.org/10.1063/1.4967277