Mechanism exploration of ion-implanted epoxy on surface trap distribution: An approach to augment the vacuum flashover voltages

The augmentation of the epoxy (EP) resin surface to advance flashover performance has become a pivotal point of global interest. This research introduces a novel surface modification method and its mechanism for insulation materials. The research follows an electron cyclotron resonance ion implantation system to subject the surface of EP insulation to ion beams with diverse energies, i.e., 6, 10, 20, 40, 50, and 60 keV for a consistent time of 300 s at an angle of 90°. The experimental phase includes the DC flashover examination under negative polarity. Besides, the simulation phase includes the Monte Carlo model constructed using SRIM software to examine the range and distribution of bombarded ions in the targeted insulation. Results reveal that the flashover properties are affected by the surface potential, surface conductivity, trap distribution, water contact angle, and elemental composition. Likewise, based on the outcomes and theoretical point of view, it is revealed that the bombardment of energetic ions enhances the trap depth, assisting in a reduction in surface conductivity, confining the surface charge movements, and extensively suppressing the secondary electron emission yield. Also, the enhanced trap depth induces homo-charge formation near triple junctions. Synergistically, the factors contribute to high flashover voltages.