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Effect of Deposition Power on the Thermoelectric Performance of Bismuth Telluride Prepared by RF Sputtering
- Source :
- Crystals, Vol 10, Iss 7, p 552 (2020)
- Publication Year :
- 2020
- Publisher :
- MDPI AG, 2020.
-
Abstract
- In this work, we present a simple method to improve the thermoelectric performance of the RF sputtered bismuth telluride films by raising the power of deposition. The as-deposited samples synthesized under different powers were investigated and compared. It shows that the films prepared under relatively higher power conditions exhibit much higher electrical conductivity to result in a greater power factor accompanied with a minor drop in the Seebeck coefficients. A relationship is established between the improvement in thermoelectric performance and the decrease in crystallinity, which might also reduce the thermal conductivity. A maximum power factor of 5.65 × 10−4 W·m−1·K−2 at 470 K is obtained for the sample deposited under 50 W with its Seebeck coefficient being −105 μV/K. The temperature-dependent behaviors of the samples are also looked into and discussed. This work might offer an in-situ and cost-effective approach to improve the performance of thermoelectric materials.
- Subjects :
- bismuth telluride
thermoelectric material
RF sputtering
Crystallography
QD901-999
Subjects
Details
- Language :
- English
- ISSN :
- 20734352
- Volume :
- 10
- Issue :
- 7
- Database :
- Directory of Open Access Journals
- Journal :
- Crystals
- Publication Type :
- Academic Journal
- Accession number :
- edsdoj.79e91eb346c0803c5dbb803f437e
- Document Type :
- article
- Full Text :
- https://doi.org/10.3390/cryst10070552