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Establishing exhaustive metasurface robustness against fabrication uncertainties through deep learning

Authors :
Jenkins Ronald P.
Campbell Sawyer D.
Werner Douglas H.
Source :
Nanophotonics, Vol 10, Iss 18, Pp 4497-4509 (2021)
Publication Year :
2021
Publisher :
De Gruyter, 2021.

Abstract

Photonic engineered materials have benefitted in recent years from exciting developments in computational electromagnetics and inverse-design tools. However, a commonly encountered issue is that highly performant and structurally complex functional materials found through inverse-design can lose significant performance upon being fabricated. This work introduces a method using deep learning (DL) to exhaustively analyze how structural issues affect the robustness of metasurface supercells, and we show how systems can be designed to guarantee significantly better performance. Moreover, we show that an exhaustive study of structural error is required to make strong guarantees about the performance of engineered materials. The introduction of DL into the inverse-design process makes this problem tractable, enabling optimization runtimes to be measurable in days rather than months and allowing designers to establish exhaustive metasurface robustness guarantees.

Details

Language :
English
ISSN :
21928614
Volume :
10
Issue :
18
Database :
Directory of Open Access Journals
Journal :
Nanophotonics
Publication Type :
Academic Journal
Accession number :
edsdoj.b77d813a335c408cb52a6d911bcbac60
Document Type :
article
Full Text :
https://doi.org/10.1515/nanoph-2021-0428