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Development of dual-beamline photoelectron momentum microscopy for valence orbital analysis
- Source :
- Journal of Synchrotron Radiation, Vol 31, Iss 3, Pp 540-546 (2024)
- Publication Year :
- 2024
- Publisher :
- International Union of Crystallography, 2024.
-
Abstract
- The soft X-ray photoelectron momentum microscopy (PMM) experimental station at the UVSOR Synchrotron Facility has been recently upgraded by additionally guiding vacuum ultraviolet (VUV) light in a normal-incidence configuration. PMM offers a very powerful tool for comprehensive electronic structure analyses in real and momentum spaces. In this work, a VUV beam with variable polarization in the normal-incidence geometry was obtained at the same sample position as the soft X-ray beam from BL6U by branching the VUV beamline BL7U. The valence electronic structure of the Au(111) surface was measured using horizontal and vertical linearly polarized (s-polarized) light excitations from BL7U in addition to horizontal linearly polarized (p-polarized) light excitations from BL6U. Such highly symmetric photoemission geometry with normal incidence offers direct access to atomic orbital information via photon polarization-dependent transition-matrix-element analysis.
Details
- Language :
- English
- ISSN :
- 16005775
- Volume :
- 31
- Issue :
- 3
- Database :
- Directory of Open Access Journals
- Journal :
- Journal of Synchrotron Radiation
- Publication Type :
- Academic Journal
- Accession number :
- edsdoj.b8e75a2732de49a2b20fb1feb6753ced
- Document Type :
- article
- Full Text :
- https://doi.org/10.1107/S1600577524002406