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Development of dual-beamline photoelectron momentum microscopy for valence orbital analysis

Authors :
Kenta Hagiwara
Eiken Nakamura
Seiji Makita
Shigemasa Suga
Shin-ichiro Tanaka
Satoshi Kera
Fumihiko Matsui
Source :
Journal of Synchrotron Radiation, Vol 31, Iss 3, Pp 540-546 (2024)
Publication Year :
2024
Publisher :
International Union of Crystallography, 2024.

Abstract

The soft X-ray photoelectron momentum microscopy (PMM) experimental station at the UVSOR Synchrotron Facility has been recently upgraded by additionally guiding vacuum ultraviolet (VUV) light in a normal-incidence configuration. PMM offers a very powerful tool for comprehensive electronic structure analyses in real and momentum spaces. In this work, a VUV beam with variable polarization in the normal-incidence geometry was obtained at the same sample position as the soft X-ray beam from BL6U by branching the VUV beamline BL7U. The valence electronic structure of the Au(111) surface was measured using horizontal and vertical linearly polarized (s-polarized) light excitations from BL7U in addition to horizontal linearly polarized (p-polarized) light excitations from BL6U. Such highly symmetric photoemission geometry with normal incidence offers direct access to atomic orbital information via photon polarization-dependent transition-matrix-element analysis.

Details

Language :
English
ISSN :
16005775
Volume :
31
Issue :
3
Database :
Directory of Open Access Journals
Journal :
Journal of Synchrotron Radiation
Publication Type :
Academic Journal
Accession number :
edsdoj.b8e75a2732de49a2b20fb1feb6753ced
Document Type :
article
Full Text :
https://doi.org/10.1107/S1600577524002406