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Fabrication and Evaluation of Trimethylmethoxysilane (TMMOS)-Derived Membranes for Gas Separation
- Source :
- Membranes, Vol 9, Iss 10, p 123 (2019)
- Publication Year :
- 2019
- Publisher :
- MDPI AG, 2019.
-
Abstract
- Gas separation membranes were fabricated with varying trimethylmethoxysilane (TMMOS)/tetraethoxy orthosilicate (TEOS) ratios by a chemical vapor deposition (CVD) method at 650 °C and atmospheric pressure. The membrane had a high H2 permeance of 8.3 × 10−7 mol m−2 s−1 Pa−1 with H2/CH4 selectivity of 140 and H2/C2H6 selectivity of 180 at 300 °C. Fourier transform infrared (FTIR) measurements indicated existence of methyl groups at high preparation temperature (650 °C), which led to a higher hydrothermal stability of the TMMOS-derived membranes than of a pure TEOS-derived membrane. Temperature-dependence measurements of the permeance of various gas species were used to establish a permeation mechanism. It was found that smaller species (He, H2, and Ne) followed a solid-state diffusion model while larger species (N2, CO2, and CH4) followed a gas translational diffusion model.
Details
- Language :
- English
- ISSN :
- 20770375
- Volume :
- 9
- Issue :
- 10
- Database :
- Directory of Open Access Journals
- Journal :
- Membranes
- Publication Type :
- Academic Journal
- Accession number :
- edsdoj.f466793e14b14b26986421ae2f809ab4
- Document Type :
- article
- Full Text :
- https://doi.org/10.3390/membranes9100123