Electromagnetic fast firing for ultrashallow junction formation

The creation of low resistivity, ultrashallow source/drain regions in MOS device structures requires rapid thermal processing (RTP) techniques that restrict diffusion and activate a significant percentage of the implanted dopant species. While current heating techniques depend upon illumination based heating, a new technology, electromagnetic induction heating (EMIH), achieves a rapid heating of the silicon by coupling electromagnetic radiation directly into the silicon wafer. Heating rates of 125 [degrees]C/s to temperatures in excess of 1050 [degrees]C have been achieved for 75--and 100-mm-diameter wafers at input powers of 1000 and 1300 W, respectively. These ramp rates are suitable for ultrashallow junction formation, and junctions shallower than 30 nm with sheet resistances lower than 600 [ohm]/square have been achieved. This paper details the application of electromagnetic heating using radiation in the microwave, 2450 MHz, frequency regime. Experimental results, comparing microwave annealed implants to the well documented SEMATECH requirements, and simulations, utilizing a coupled electromagnetic-thermal computer model, of the heating process are discussed. Index Terms--Activation, anneal, dopant, junction, microwave, radiation, shallow.