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Intel slates 2007 for high-k shift -- Demo of mystery material cuts leakage current by 100%

Authors :
Lammers, David
Source :
Electronic Engineering Times. Nov 10, 2003, p1
Publication Year :
2003

Subjects

Subjects :
Integrated circuit fabrication
Semiconductor industry
Intel Corp. -- Product development
Dielectrics -- Usage
Integrated circuit fabrication
Semiconductor industry -- Product development

Details

Language :
English
ISSN :
01921541
Database :
Gale General OneFile
Journal :
Electronic Engineering Times
Publication Type :
Periodical
Accession number :
edsgcl.109987441

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