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Reliability improvement of rapid thermal oxide using gas switching
- Source :
- IEEE Transactions on Semiconductor Manufacturing. Nov, 2003, Vol. 16 Issue 4, p656, 3 p.
- Publication Year :
- 2003
-
Abstract
- The instantaneous switch-off of the gas precursors during the ramp-down cycle in a spike ramp process is demonstrated to be an effective method to enhance the reliability of rapid thermal oxide. Due to the slow ramp-down rate (60[degrees]C-90[degrees]C/s) of a rapid thermal process, the oxidation during the slow ramp-down cycle may produce the inferior oxide, especially for ultrathin oxide. To avoid the oxidation in the slow ramp-down cycle, the oxidation precursor (oxygen) is switched off during the ramp-down cycle. The reliability of resulting oxide without oxidation during the ramp-down cycle is enhanced as compared with the conventional oxide, which is still oxidized during the ramp-down cycle. Index Terms--Gas switching, rapid thermal oxidation, reliability, spike ramp.
Details
- Language :
- English
- ISSN :
- 08946507
- Volume :
- 16
- Issue :
- 4
- Database :
- Gale General OneFile
- Journal :
- IEEE Transactions on Semiconductor Manufacturing
- Publication Type :
- Academic Journal
- Accession number :
- edsgcl.111027431