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Reliability improvement of rapid thermal oxide using gas switching

Authors :
Lee, Min Hung
Yu, Cheng-Ya
Yuan, Fon
Chen, K.-F.
Lai, Chang-Chi
Liu, Chee Wee
Source :
IEEE Transactions on Semiconductor Manufacturing. Nov, 2003, Vol. 16 Issue 4, p656, 3 p.
Publication Year :
2003

Abstract

The instantaneous switch-off of the gas precursors during the ramp-down cycle in a spike ramp process is demonstrated to be an effective method to enhance the reliability of rapid thermal oxide. Due to the slow ramp-down rate (60[degrees]C-90[degrees]C/s) of a rapid thermal process, the oxidation during the slow ramp-down cycle may produce the inferior oxide, especially for ultrathin oxide. To avoid the oxidation in the slow ramp-down cycle, the oxidation precursor (oxygen) is switched off during the ramp-down cycle. The reliability of resulting oxide without oxidation during the ramp-down cycle is enhanced as compared with the conventional oxide, which is still oxidized during the ramp-down cycle. Index Terms--Gas switching, rapid thermal oxidation, reliability, spike ramp.

Details

Language :
English
ISSN :
08946507
Volume :
16
Issue :
4
Database :
Gale General OneFile
Journal :
IEEE Transactions on Semiconductor Manufacturing
Publication Type :
Academic Journal
Accession number :
edsgcl.111027431