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Modeling of grain growth mechanism by nickel silicide reactive grain boundary effect in metal-induced-lateral-crystallization

Authors :
Cheng, C.F.
Poon, Vincent M.C.
Kok, C.W.
Chan, Mansun
Source :
IEEE Transactions on Electron Devices. June, 2003, Vol. 50 Issue 6, p1467, 8 p.
Publication Year :
2003

Abstract

The growth mechanism of metal induced lateral crystallization (MILC) is examined and modeled.

Details

Language :
English
ISSN :
00189383
Volume :
50
Issue :
6
Database :
Gale General OneFile
Journal :
IEEE Transactions on Electron Devices
Publication Type :
Academic Journal
Accession number :
edsgcl.111090738