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Effects of in situ magnetic field application and postdeposition magnetic annealing on sputtered Ni80Fe20/Fe50Mn50/Ni80Fe20 trilayers

Authors :
Chen, F.H.
Ng, V.
Adeyeye, A.O.
Lee, J.Y.
Rhee, J.R.
Hwang, D.G.
Lee, S.S.
Source :
Journal of Applied Physics. May 15, 2003, Vol. 93 Issue 10, 6605-6607
Publication Year :
2003

Abstract

Effects of in situ magnetic field and/or postdeposition magnetic annealing on the properties of Ni80Fe20/Fe50Mn50/Ni80Fe20 trilayer structure are discussed. The annealing in the case has produced more grains with reversible moments than irreversible moments.

Details

Language :
English
ISSN :
00218979
Volume :
93
Issue :
10
Database :
Gale General OneFile
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
edsgcl.123524724