Series resistance of self-aligned silicided source/drain structure

Numerical simulations are conducted to investigate the effect of contact interface recession on the external resistance of self-aligned silicided (salicide) source/drain structures. It is shown that the silicidation mechanismcauses a rise in resistance that may be in the order of several hundred ohms-micrometers. The simulated results are then compared to reported measurements of external resistance for which a 20% error is found.