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Low-energy contributions to positron implantation

Authors :
Ritley, K. A.
Lynn, K.G.
Ghosh, V.J.
Welch, D.O.
McKeown, M.
Source :
Journal of Applied Physics. Sept 1, 1993, Vol. 74 Issue 5, p3479, 18 p.
Publication Year :
1993

Abstract

Depth profiling and data analysis in slow position experiments reveal more information on the position implantation. The simulation of the behavior incident at different kilo electron volt energies are effected by the Monte Carlo simulations. The mechanisms of conduction- electron and longitudinal acoustic phonon scattering describe the final stages of position thermalization in Al, Cu and Au from 25 electron volts. The data, including implantation profiles, fraction and energy distribution of reemitted positron, are yielded by the Monte Carlo simulation.

Details

ISSN :
00218979
Volume :
74
Issue :
5
Database :
Gale General OneFile
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
edsgcl.14580835