Rapid photochemical deposition of silicon dioxide films using an excimer lamp

A photo-CVD excimer lamp helps deposit silicon dioxide films at low temperatures and high deposition rates through the release of photon fluxes in the 172 nm wavelength band. Fourier transform infrared spectroscopy and ellipsometry help characterize the properties of photodeposited films. The photodeposition method lowers the hydrogen inclusion to low levels, making this technique suitable for electronic and thin film processing.