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Growth and thermal decomposition of ultrathin ion-beam deposited C:H films
- Source :
- Journal of Applied Physics. March 15, 1995, Vol. 77 Issue 6, p2462, 12 p.
- Publication Year :
- 1995
-
Abstract
- Thick hydrogenated carbon films, C:H, are prepared by the process of deposition of several monolayers an appropriate target by the ion beam deposition technique. The initial growth of the film requires a low Z buffer layer with a platinum like material as catalyst. The thin C:H the ion energy to 100 electron volts at a substrate temperature of 350 K.
Details
- ISSN :
- 00218979
- Volume :
- 77
- Issue :
- 6
- Database :
- Gale General OneFile
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- edsgcl.17149438