Properties of SiGe oxides grown in a microwave oxygen plasma

Subjects

Subjects :

Plasma (Ionized gases) -- Research
Dielectric films -- Research
Oxidation-reduction reaction -- Research
Physics

Details

ISSN :

00218979

Volume :

78

Issue :

10

Database :

Gale General OneFile

Journal :

Journal of Applied Physics

Publication Type :

Academic Journal

Accession number :

edsgcl.18072944