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IBM and Mentor Graphics to Develop 22nm Computational Lithography Solution for the Integrated Circuit Industry
- Source :
- Business Wire. September 17, 2008
- Publication Year :
- 2008
-
Abstract
- ARMONK, N.Y. & WILSONVILLE, Ore. -- IBM (NYSE: IBM) and Mentor Graphics Corporation (Nasdaq: MENT) today announced an agreement to jointly develop and distribute next-generation computational lithography (CL) software solutions [...]
- Subjects :
- Mentor Graphics Corp. -- Production processes
International Business Machines Corp. -- Production processes
Computer software industry -- Production processes
Software -- Production processes
Semiconductor industry -- Production processes
Integrated circuits -- Production processes
Semiconductor chips -- Production processes
Computer industry -- Production processes
Semiconductor industry
Standard IC
Software quality
Microcomputer industry
Computer industry
Business
Business, international
Subjects
Details
- Language :
- English
- Database :
- Gale General OneFile
- Journal :
- Business Wire
- Publication Type :
- News
- Accession number :
- edsgcl.185221212