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High-frequency noise performance of 60-nm gate-length FinFETs

Authors :
Raskin, Jean-Pierre
Pailloncy, Guillaume
Lederer, Dimitri
Danneville, Francois
Dambrine, Gilles
Decoutere, Stefaan
Mercha, Abdelkarim
Parvais, Bertrand
Source :
IEEE Transactions on Electron Devices. Oct, 2008, Vol. 55 Issue 10, p2718, 10 p.
Publication Year :
2008

Abstract

The radio-frequency noise performance of FinFETs from a 60-nm gate length is investigated. It is observed that the fringing capacitance of the 3-D and multifin structure of the FinFETS is responsible for the degradation of its noise performance.

Details

Language :
English
ISSN :
00189383
Volume :
55
Issue :
10
Database :
Gale General OneFile
Journal :
IEEE Transactions on Electron Devices
Publication Type :
Academic Journal
Accession number :
edsgcl.189853043