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New negative-tone photoresists avoid swelling and distortion

Authors :
Gruetzner, Gabi
Fehlberg, Simone
Voigt, Anja
Loechel, Bernd
Rothe, Martina
Source :
Solid State Technology. January, 1997, Vol. 40 Issue 1, p79, 4 p.
Publication Year :
1997

Abstract

A wide range of photosensitive organic materials are used as photoresists for fabricating integrated circuits. Both positive- and negative-tone resists are needed to simplify and lower the costs of device […]

Subjects

Subjects :
Semiconductor industry
Photoresists -- Design and construction -- Equipment and supplies
Masks (Electronics) -- Equipment and supplies
Semiconductor industry -- Equipment and supplies

Details

Language :
English
ISSN :
0038111X
Volume :
40
Issue :
1
Database :
Gale General OneFile
Journal :
Solid State Technology
Publication Type :
Periodical
Accession number :
edsgcl.19141131

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