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Advanced lithography at critical juncture
- Source :
- Electronic News (1991). October 13, 1997, Vol. 43 Issue 2189, p1, 7 p.
- Publication Year :
- 1997
-
Abstract
- Colorado Springs, Colo.--The lights go on. The smoke floats up. A tuxedoed announcer steps to the center of a canvas square. He grabs a microphone that drops down from the […]
- Subjects :
- Semiconductor production equipment
Sematech Centers of Excellence -- Conferences, meetings and seminars
Lithography, Electron beam -- Methods -- Conferences, meetings and seminars
Semiconductor production equipment -- Design and construction -- Conferences, meetings and seminars -- Methods
Subjects
Details
- Language :
- English
- ISSN :
- 10616624
- Volume :
- 43
- Issue :
- 2189
- Database :
- Gale General OneFile
- Journal :
- Electronic News (1991)
- Publication Type :
- Periodical
- Accession number :
- edsgcl.19892981