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Applied unveils 2 detect systems for multi-use
- Source :
- Electronic News (1991). February 9, 1998, Vol. 44 Issue 2205, p32, 2 p.
- Publication Year :
- 1998
-
Abstract
- Santa Clara, Calif.--Applied Materials last week introduced a pair of integrated wafer defect detection systems known as the WF-736 DUO and WF-731. The systems are targeted toward different applications, but […]
- Subjects :
- Semiconductor production equipment
Semiconductor production equipment industry
Applied Materials Inc. -- Product introduction
Applied Materials WF-736 DUO (Semiconductor production equipment) -- Product introduction
Applied Materials WF-731 (Semiconductor production equipment) -- Product introduction
Semiconductor production equipment industry -- Product introduction
Computers -- Product introduction
Semiconductor production equipment -- Product introduction
Subjects
Details
- Language :
- English
- ISSN :
- 10616624
- Volume :
- 44
- Issue :
- 2205
- Database :
- Gale General OneFile
- Journal :
- Electronic News (1991)
- Publication Type :
- Periodical
- Accession number :
- edsgcl.20304193