Optical constants of in situ-deposited films of important extreme-ultraviolet multilayer mirror materials

We have performed angle-dependent reflectance measurements of in situ magnetron sputtered films of [B.sub.4]C, C, Mo, Si, and W. The Fresnel relations were used to determine the complex index of refraction from the reflectance data in the region of approximately 35-150 eV. In the cases of Si, C, and [B.sub.4]C we found excellent agreement with published data. However, for Mo and W we found that the optical properties from 35 to 60 eV differed significantly from those in the literature.