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Enhancements of substrate deposition rate and target erosion profile in a dc magnetron sputtering system
- Source :
- IEEE Transactions on Magnetics. Oct, 2009, Vol. 45 Issue 10, p4391, 4 p.
- Publication Year :
- 2009
Details
- Language :
- English
- ISSN :
- 00189464
- Volume :
- 45
- Issue :
- 10
- Database :
- Gale General OneFile
- Journal :
- IEEE Transactions on Magnetics
- Publication Type :
- Academic Journal
- Accession number :
- edsgcl.209901003