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Modeling of silicon carbide ECR etching by feed-forward neural network and its physical interpretations

Authors :
Jing-Hua Xia
Rusli Kumta, A.
Source :
IEEE Transactions on Plasma Science. May, 2010, Vol. 38 Issue 5, p1091, 6 p.
Publication Year :
2010

Details

Language :
English
ISSN :
00933813
Volume :
38
Issue :
5
Database :
Gale General OneFile
Journal :
IEEE Transactions on Plasma Science
Publication Type :
Academic Journal
Accession number :
edsgcl.230372645