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High-temperature dielectric response in pulsed laser deposited [Bi.sub.1.5][Zn.sub.1.0][Nb.sub.1.5][O.sub.7] thin films
- Source :
- Journal of Applied Physics. Sept 1, 2010, Vol. 108 Issue 5, 054106-1-054106-6
- Publication Year :
- 2010
-
Abstract
- Cubic pyrochlore [Bi.sub.1.5][Zn.sub.1.0][Nb.sub.1.5][O.sub.7] thin films are deposited by pulsed laser ablation on Pt(200)/Si[O.sub.2]/Si at high temperatures and the dielectric response of the thin films grown at 650 [degree]C are characterized. The dielectric dispersion in the thin films has shown a Maxwell-Wagner type relaxation with two different kinds of response that is confirmed by temperature dependent Nyquist plots.
- Subjects :
- Bismuth -- Electric properties
Bismuth -- Optical properties
Ablation (Vaporization technology) -- Usage
Niobium -- Electric properties
Niobium -- Optical properties
Platinum -- Electric properties
Platinum -- Optical properties
Platinum -- Thermal properties
Silica -- Electric properties
Silica -- Optical properties
Silica -- Thermal properties
Dielectric films -- Electric properties
Dielectric films -- Optical properties
Dielectric films -- Thermal properties
Thin films -- Electric properties
Thin films -- Optical properties
Thin films -- Thermal properties
Zinc alloys -- Electric properties
Zinc alloys -- Optical properties
Physics
Subjects
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 108
- Issue :
- 5
- Database :
- Gale General OneFile
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- edsgcl.240900261