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Simulated plasma immersion ion implantation processing of thin wires

Authors :
Lejars, A.
Manova, D.
Mandl, S.
Duday, D.
Wirtz, T.
Source :
Journal of Applied Physics. Sept 15, 2010, Vol. 108 Issue 6, 063308-1-063308-4
Publication Year :
2010

Abstract

Several analytical simulation studies are conducted to explain the mechanisms involved in the plasma immersion ion implantation processing of the various thin wires. The impact of the substrate geometry on the sheath expansion and ion flux density of these wires is also analyzed.

Subjects

Subjects :
Ion implantation -- Usage
Plasma density -- Analysis
Plasma devices -- Analysis
Physics

Details

Language :
English
ISSN :
00218979
Volume :
108
Issue :
6
Database :
Gale General OneFile
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
edsgcl.241004838

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