New Findings in Nanotechnology - Chemical Vapor Deposition Described by C.H. Chiang and Co-Researchers

'Mirror-like and pit-free non-polar a-plane (11-20) GaN films are grown on r-plane (1-102) sapphire substrates using metalorganic chemical vapor deposition (MOCVD) with multilayer high-low-high temperature AlN buffer layers. The buffer [...]