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Junction termination extension implementing drive-in diffusion of boron for high-voltage SiC devices

Authors :
Bolotnikov, A.V.
Muzykov, P.G.
Qingchun Zhang
Agarwal, A.K.
Sudarshan, T.S.
Source :
IEEE Transactions on Electron Devices. August, 2010, Vol. 57 Issue 8, p1930, 5 p.
Publication Year :
2010

Details

Language :
English
ISSN :
00189383
Volume :
57
Issue :
8
Database :
Gale General OneFile
Journal :
IEEE Transactions on Electron Devices
Publication Type :
Academic Journal
Accession number :
edsgcl.317381183