Photolysis of Disilane at 193 nm

A deduction of the primary photodissociation mechanism of Si2H6 at 193 nm was made by photoproduct detection by laser-induced fluorescence (LIF) and time-resolved mass spectrometry techniques. Observation of the Si2H6 was conducted by the LIF method. No signal has been detected from SiH3, Si2H5, Si2H3 and Si2H4 in 193 nm photolysis. The importance of H2 elimination processes in Si2H6 produced in 193 nm photolysis was suggested by existing data combination.