Mo/SiO2 multilayers for soft x-ray optical applications

Keen research interest has ben focused on the production of x-ray multilayers for short wavelength range because of the potential applications of such multilayers in a variety of technologies. A study was therefore conducted to investigate the microstructure and profiles of Mo/SiO2 multilayers. Among other results, it was found that MoSiO2 multilayers with very good composition modulation structures and smooth/acute interfaces between Mo and SiO2 may form by magnetron sputtering.