Characterization of ion beam and magnetron sputtered thin Ta/NiFe films

Authors :: Mao, M.
Leng, Q.
Huai, Y.
Johnson, P.
Miller, M.
Tong, H.-C.
Miloslavsky, L.
Qian, C.
Wang, J.
Hegde, H.
Source :: Journal of Applied Physics. April 15, 1999, Vol. 85 Issue 8, p5780, 3 p.
Publication Year :: 1999
Abstract: The magnetic properties and microstructure of NiFe films deposited via ion beam deposition (IBD), pulsed, and static magnetron sputtering techniques are studied. Results show that grain size is the same among NiFe films with the same thickness regardless of the deposition technique. However, IBD films have superior (111) texture and crystallinity. It is shown that the superior magnetic properties of IBD Ta/NiFe films are due to their high crystallographic quality.