Texture development mechanisms in ion beam assisted deposition

The crystallographic texture selection mechanisms during the ion beam assisted deposition (IBAD) of polycrystalline films are determined using molecular dynamic simulations of IBAD. The simulations involve growing a face centered cubic bicrystal made up of (111) and (110) oriented grains while an ion beam impacted the growing film at normal incidence. It is shown that both ion beam induced atomic sputtering from the surface and ion beam induced damage are reduced when the ion beam is oriented along the channeling directions of the crystals.