Effects of preirradiation and thermal annealing on photoinduced defects creation in synthetic silica glass

An investigation of the effects of argon-fluoride-(ArF) excimer laser preirradiation and thermal annealing on the creation of photoinduced defects on synthetic silica glass has been conducted. The experiment confirmed the procedure's enhancing effect on the durability of silica glass treated by conventional ArF-excimer laser. Optical absorption measurements indicate a strong role for preirradiation in the relaxation of weak portions in the glass such as the Si-O-Si bonds.