Application of a DC glow discharge source with controlled plasma potential in plasma immersion ion implantation

The use of a DC glow discharge source with controlled plasma potential in plasma immersion ion implantation processing has been studied. The characteristics of the discharge source include medium densities, low temperatures, stable continuous DC operation and can be built inexpensively. A tridimensional implantation was realized when the plasma potential is held below 70 V. The plasma density of the discharge source has also been found to be linearly dependent on the potential.