Studies from Zhejiang University Describe New Findings in Atomic Layer Deposition (Afm Study On the Surface Morphologies of Tin Films Prepared By Magnetron Sputtering and Al2o3 Films Prepared By Atomic Layer Deposition)

Source :: Electronics Newsweekly. April 30, 2019, 4065
Publication Year :: 2019
Abstract: 2019 APR 30 (VerticalNews) -- By a News Reporter-Staff News Editor at Electronics Newsweekly -- Current study results on Nanotechnology - Atomic Layer Deposition have been published. According to news [...]

Subjects :: Atomic force microscopy -- Research
Nitrides -- Research
Aluminum oxide -- Research
Microscopy
Electrodes
Capacitors
Aluminum compounds
Editors
Electronics

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