Cite
Closed-loop bias voltage control for plasma etching
MLA
Patrick, Roger, et al. “Closed-Loop Bias Voltage Control for Plasma Etching.” Solid State Technology, vol. 43, no. 2, Feb. 2000, p. 59. EBSCOhost, widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsggo&AN=edsgcl.60111270&authtype=sso&custid=ns315887.
APA
Patrick, R., Baldwin, S., & Williams, N. (2000, February 1). Closed-loop bias voltage control for plasma etching. Solid State Technology, 43(2), 59.
Chicago
Patrick, Roger, Scott Baldwin, and Norman Williams. 2000. “Closed-Loop Bias Voltage Control for Plasma Etching.” Solid State Technology, February 1. http://widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsggo&AN=edsgcl.60111270&authtype=sso&custid=ns315887.