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Modeling of thermal stresses in metal interconnects: effects of line aspect ratio

Authors :
Shen, Y.-L.
Source :
Journal of Applied Physics. August 15, 1997, Vol. 82 Issue 4, p1578, 4 p.
Publication Year :
1997

Abstract

A series of parallel aluminum lines embedded in silicon dioxide are analyzed using finite element analyses. Numerical results for evolution of thermal stresses are given. Maximum stresses in periodically arranged aluminum lines do not show up when the line width and the line height are about equal. This is not found when the single-line approach is used. Variation of stresses with line aspect ratio is affected by spacing of lines.

Details

ISSN :
00218979
Volume :
82
Issue :
4
Database :
Gale General OneFile
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
edsgcl.60142589