Back to Search Start Over

Putting a Mask an a Viable X Architecture

Authors :
CHAPPELL, JEFF
Source :
Electronic News (1991). October 8, 2001, Vol. 47 Issue 41, p2
Publication Year :
2001

Abstract

DuPont Photomasks, partners produce potential reticle X architecture took a step toward the semiconductor mainstream today with DuPont Photomasks Inc. (DPI) and Simplex Solutions Inc. saying that they have produced […]

Details

Language :
English
ISSN :
10616624
Volume :
47
Issue :
41
Database :
Gale General OneFile
Journal :
Electronic News (1991)
Publication Type :
Periodical
Accession number :
edsgcl.79056437