Formation mechanism of hydrogenated silicon clusters during thermal decomposition of disilane

Authors :: Tonokura, Kenichi
Murasaki, Tetsuya
Koshi, Mitsuo
Source :: Journal of Physical Chemistry B. Jan 24, 2002, Vol. 106 Issue 3, p555, 9 p.
Publication Year :: 2002

Subjects :: Semiconductor industry -- Research
Silicon crystals -- Analysis
Decomposition (Chemistry) -- Usage
Chemical reaction, Rate of -- Analysis
Chemicals, plastics and rubber industries

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