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Characterization of nano-oxide layers fabricated by ion beam oxidation

Authors :
Cardoso, Susana
Zhang, Zongzhi
Li, Haohua
Ferreira, Ricardo
Freitas, Paulo P.
Wei, Peng
Soares, Jose C.
Snoeck, Etienne
Batlle, Xavier
Source :
IEEE Transactions on Magnetics. Sept, 2002, Vol. 38 Issue 5, p2755, 3 p.
Publication Year :
2002

Abstract

In this paper, a remote [O.sub.2] ion source is used for the formation of nano-oxide layers. The oxidation efficiency was measured in CoFe-oxide films, and a decrease of the oxide layer with the pan angle and the oxidation pressure is observed. For the same oxidation pressure, the oxidation efficiency depends on the [O.sub.2] content in the Ar-[O.sub.2] plasma. These results were applied in optimizing the fabrication of [Al.sub.2][O.sub.3] barrier for tunnel junctions. This method was also used to fabricate junctions with Fe-oxide layers inserted at the [Al.sub.2][O.sub.3]-CoFe interface. TEM and magnetization data indicate that after anneal at 385[degrees]C, a homogeneons ferromagnetic Fe-oxide layer ([Fe.sub.3][O.sub.4]?) is formed. Index Terms--Ion oxidation, nano-oxide layers, transmission electron microscopy, tunnel junctions.

Details

ISSN :
00189464
Volume :
38
Issue :
5
Database :
Gale General OneFile
Journal :
IEEE Transactions on Magnetics
Publication Type :
Academic Journal
Accession number :
edsgcl.94130707