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Development of ion-implantation confined, shallow mesa stripe (Pn,Sn)Te/Pb(Te,Se) DH laser diodes

Authors :
Fonstad, C. G
Harton, A
Jiang, Y.-N
Appelman, H
Publication Year :
1983
Publisher :
United States: NASA Center for Aerospace Information (CASI), 1983.

Abstract

Preliminary results of a program to develop ion implantation confined, shallow mesa stripe (Pb,Sn)Te laser diodes are presented. The practicality of using a shallow mesa stripe to produce single mode laser output and to increase the single mode tuning range are demonstrated. The first results of p-type ion implantation in the lead-tin salts are also reported. It is shown that sodium and lithium both can be used to convert n-type Pb(Te,Se) to p-type. The implant and anneal procedures are described, and electrical characteristics of Li-implanted layers are presented.

Subjects

Subjects :
Lasers And Masers

Details

Language :
English
Database :
NASA Technical Reports
Notes :
NAG1-48
Publication Type :
Report
Accession number :
edsnas.19840060516
Document Type :
Report