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Simple, extremely low resistance contact system to n-InP that does not exhibit metal-semiconductor intermixing during sintering
- Source :
- Applied Physics Letters. 62(21)
- Publication Year :
- 1993
- Publisher :
- United States: NASA Center for Aerospace Information (CASI), 1993.
-
Abstract
- Contact formation to InP is plagued by the violent metal-semiconductor intermixing that takes place during the contact sintering process. We have discovered a truly unique contact system, involving Au and Ge, which is easily fabricated, which exhibits extremely low values of contact resistivity, and in which there is virtually no metal-semiconductor interdiffusion, even after extended sintering. We present a description of this contact system and suggest possible mechanisms to explain the observed behavior.
- Subjects :
- Electronics And Electrical Engineering
Subjects
Details
- Language :
- English
- ISSN :
- 00036951
- Volume :
- 62
- Issue :
- 21
- Database :
- NASA Technical Reports
- Journal :
- Applied Physics Letters
- Notes :
- NAS3-25266
- Publication Type :
- Report
- Accession number :
- edsnas.19930058553
- Document Type :
- Report
- Full Text :
- https://doi.org/10.1063/1.109247