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Simple, extremely low resistance contact system to n-InP that does not exhibit metal-semiconductor intermixing during sintering

Authors :
Weizer, Victor G
Fatemi, Navid S
Source :
Applied Physics Letters. 62(21)
Publication Year :
1993
Publisher :
United States: NASA Center for Aerospace Information (CASI), 1993.

Abstract

Contact formation to InP is plagued by the violent metal-semiconductor intermixing that takes place during the contact sintering process. We have discovered a truly unique contact system, involving Au and Ge, which is easily fabricated, which exhibits extremely low values of contact resistivity, and in which there is virtually no metal-semiconductor interdiffusion, even after extended sintering. We present a description of this contact system and suggest possible mechanisms to explain the observed behavior.

Details

Language :
English
ISSN :
00036951
Volume :
62
Issue :
21
Database :
NASA Technical Reports
Journal :
Applied Physics Letters
Notes :
NAS3-25266
Publication Type :
Report
Accession number :
edsnas.19930058553
Document Type :
Report
Full Text :
https://doi.org/10.1063/1.109247