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Silicon Nitride Surface Passivation

Authors :
IIT RESEARCH INST CHICAGO ILL RELIABILITY ANALYSIS CENTER
Myers,T. R.
IIT RESEARCH INST CHICAGO ILL RELIABILITY ANALYSIS CENTER
Myers,T. R.
Source :
DTIC AND NTIS
Publication Year :
1969

Abstract

The monograph presents a review of the state of the art of silicon nitride usage by discussing: Problems with use of silicon dioxide (Background); The uses of silicon nitride in the planar process; Silicon nitride processing; Reliability experience with silicon nitride.

Details

Database :
OAIster
Journal :
DTIC AND NTIS
Notes :
text/html, English
Publication Type :
Electronic Resource
Accession number :
edsoai.ocn831725388
Document Type :
Electronic Resource