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Research on Mercury Cadmium Telluride

Authors :
RENSSELAER POLYTECHNIC INST TROY NY DEPT OF ELECTRICAL COMPUTER AND SYSTEMS ENGINEERING
Ghandhi, Sorab K.
Bhat, Ishwara B.
RENSSELAER POLYTECHNIC INST TROY NY DEPT OF ELECTRICAL COMPUTER AND SYSTEMS ENGINEERING
Ghandhi, Sorab K.
Bhat, Ishwara B.
Source :
DTIC AND NTIS
Publication Year :
1990

Abstract

This report summarizes work done over a five-year period on a program entitled, Research on Mercury Cadmium Telluride. Using the alloy growth OMVPE process, we have obtained compositional uniformity of 0.005 over a 2 GaAs slice. p-type doping to 10 17/cm3 and n-type doping to 4 x 10 18/cm3 have been achieved using As and In respectively. Annealing studies have shown that the background concentration of undoped HgCdTe is around 5 x 10 14/cm3. Passivation techniques, using anodic sulfidization, have been developed for HgCdTe. Both p-n diodes and field effect transistors have been demonstrated on material grown during the course of this program. A diffusion length of 120 microns has been measured in material with x = 0.3.

Details

Database :
OAIster
Journal :
DTIC AND NTIS
Notes :
text/html, English
Publication Type :
Electronic Resource
Accession number :
edsoai.ocn832080075
Document Type :
Electronic Resource