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Single-layer halftone phase-shifting masks for DUV microlithography: optical property simulation and chromium compound film preparation
- Source :
- Jiang, Z-T <
- Publication Year :
- 1997
-
Abstract
- The investigation of single layer halftone phase shift mask (SLHTPSM) has been carried by both simulation and chromium fluoride film fabrication. Theoretical analysis provides the optimum SLHTPSM constructions for I-line (365 nm), KrF (248 nm) and ArF (193 nm) microlithographies. A fully characterization of chromium fluoride film processed by de magnetron sputtering shows a feasibility of using this film in the fabricating DUV-PSM.
Details
- Database :
- OAIster
- Journal :
- Jiang, Z-T <
- Notes :
- English
- Publication Type :
- Electronic Resource
- Accession number :
- edsoai.ocn839868973
- Document Type :
- Electronic Resource