Atomic layer deposition instrument for in-situ environmental TEM imaging of ALD process

Authors :: Todeschini, Matteo
Windmann, Peter
Jensen, Flemming
Wagner, Jakob Birkedal
Han, Anpan
Todeschini, Matteo
Windmann, Peter
Jensen, Flemming
Wagner, Jakob Birkedal
Han, Anpan
Source :: Todeschini , M , Windmann , P , Jensen , F , Wagner , J B & Han , A 2016 , ' Atomic layer deposition instrument for in-situ environmental TEM imaging of ALD process ' , 42nd International conference on Micro and Nano Engineering , Vienna , Austria , 19/09/2016 - 23/09/2016 .
Publication Year :: 2016

Database :: OAIster
Journal :: Todeschini , M , Windmann , P , Jensen , F , Wagner , J B & Han , A 2016 , ' Atomic layer deposition instrument for in-situ environmental TEM imaging of ALD process ' , 42nd International conference on Micro and Nano Engineering , Vienna , Austria , 19/09/2016 - 23/09/2016 .
Notes :: application/pdf, English
Publication Type :: Electronic Resource
Accession number :: edsoai.ocn970406660
Document Type :: Electronic Resource

Tools