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Accessing new 2D semiconductors with optical band gap: synthesis of iron-intercalated titanium diselenide thin films via LPCVD

Authors :
Sanchez-Perez, C. (Clara)
Knapp, C. E. (Caroline E.)
Colman, R. H. (Ross H.)
Sotelo-Vazquez, C. (Carlos)
Oilunkaniemi, R. (Raija)
Laitinen, R. S. (Risto S.)
Carmalt, C. J. (Claire J.)
Sanchez-Perez, C. (Clara)
Knapp, C. E. (Caroline E.)
Colman, R. H. (Ross H.)
Sotelo-Vazquez, C. (Carlos)
Oilunkaniemi, R. (Raija)
Laitinen, R. S. (Risto S.)
Carmalt, C. J. (Claire J.)
Publication Year :
2018

Abstract

Fe-doped TiSe2 thin-films were synthesized via low pressure chemical vapor deposition (LPCVD) of a single source precursor: [Fe(η5-C5H4Se)2Ti(η5-C5H5)2]2 (1). Samples were heated at 1000 °C for 1–18 h and cooled to room temperature following two different protocols, which promoted the formation of different phases. The resulting films were analyzed by grazing incidence X-ray diffraction (GIXRD), X-ray photoelectron spectroscopy (XPS), scanning electron microscope (SEM) and UV/vis spectroscopy. An investigation of the Fe doping limit from a parallel pyrolysis study of FexTiSe2 powders produced in situ during LPCVD depositions has shown an increase in the Fe–TiSe2–Fe layer width with Fe at% increase. Powders were analyzed using powder X-ray diffraction (PXRD) involving Rietveld refinement and XPS. UV/vis measurements of the semiconducting thin films show a shift in band gap with iron doping from 0.1 eV (TiSe2) to 1.46 eV (Fe0.46TiSe2).

Details

Database :
OAIster
Notes :
application/pdf, English
Publication Type :
Electronic Resource
Accession number :
edsoai.on1107557831
Document Type :
Electronic Resource