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Preface : Advanced gate stack, source/drain and channel engineering for Si-based CMOS 4 : new materials, processes and equipment
- Source :
- ECS Transactions vol.13 (2008) nr.1 p.III- [ISSN 1938-5862]
- Publication Year :
- 2008
Details
- Database :
- OAIster
- Journal :
- ECS Transactions vol.13 (2008) nr.1 p.III- [ISSN 1938-5862]
- Notes :
- Timans, P.J.
- Publication Type :
- Electronic Resource
- Accession number :
- edsoai.on1359163298
- Document Type :
- Electronic Resource