High power light source for future EUV lithography based on ERL-FEL

The continuous development to increase the intensity of the EUV light source for future EUV lithography is important to realize the high through put fine patterning. The ERL-FEL, which is an accelerator based light source, would be one of the candidates for this one. This paper clarifies the design concept of the ERL-FEL for EUV light source for future lithography, the delivery systems of the FEL light to multi-scanners and also future development items of the accelerator technologies and a possibility of the beyond EUV.