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Near-infrared photodetectors based on single germanium nanowires

Authors :
(0000-0002-2708-2718) Echresh, A.
(0000-0002-7958-4306) Shaikh, M. S.
Helm, M.
(0000-0001-6368-8728) Erbe, A.
(0000-0003-3529-0207) Berencen, Y.
(0000-0002-8066-6392) Rebohle, L.
(0000-0002-3146-8031) Georgiev, Y.
(0000-0002-2708-2718) Echresh, A.
(0000-0002-7958-4306) Shaikh, M. S.
Helm, M.
(0000-0001-6368-8728) Erbe, A.
(0000-0003-3529-0207) Berencen, Y.
(0000-0002-8066-6392) Rebohle, L.
(0000-0002-3146-8031) Georgiev, Y.
Source :
Micro and Nano Engineering (MNE) conference, 25.-28.09.2023, Berlin, Germany
Publication Year :
2023

Abstract

Germanium (Ge) is a promising candidate for designing near-infrared photodetectors because of its bandgap (0.66 eV), which induces a large absorption coefficient at near-infrared wavelengths. Also, Ge has excellent compatibility of parallel processing with silicon technology [1,2]. Photodetectors based on Ge material have been fabricated with different structures such as metal-semiconductor-metal (MSM) and p−n junctions. On the other hand, the observation of high responsivity in semiconductor nanowires with a high surface-to-volume ratio has attracted growing interest in using nanowires in photodetectors. So far, significant efforts have been made to fabricate single nanowire-based photodetectors with different materials such as Si, Ge, and GaN to achieve miniaturized devices with high responsivity and short response time [3-5]. Hence, Ge nanowires are an excellent candidate to fabricate single nanowire-based near-infrared photodetectors. In this work, we report on the fabrication and characterization of an axial p−n junction along Ge nanowires. First, through a resist mask created by electron beam lithography (EBL), the top Ge layers of germanium-on-insulator (GeOI) substrates were locally doped with phosphorus ions using ion beam implantation followed by rear-side flash lamp annealing. Then, the single Ge nanowire-based photodetectors containing an axial p−n junction were fabricated using EBL and inductively coupled plasma reactive ion etching. The fabricated single Ge nanowire devices demonstrate the rectifying current−voltage characteristic of a p−n diode in dark conditions. Moreover, the photoresponse of the axial p−n junction-based photodetectors was investigated under light illumination with three different wavelengths: 637 nm, 785 nm, and 1550 nm. The measurements indicated that the fabricated photodetectors can be operated at zero bias and room temperature under ambient conditions. A high responsivity of 3.7×102 AW-1 and a detectivity of 1.9×1013 cmHz1/2W-1

Details

Database :
OAIster
Journal :
Micro and Nano Engineering (MNE) conference, 25.-28.09.2023, Berlin, Germany
Notes :
English
Publication Type :
Electronic Resource
Accession number :
edsoai.on1415609493
Document Type :
Electronic Resource